Originality Presentation Location Contact Sites Clients
Evaporation Sputtering systems P.E.C.V.D. Plasma Etching Ashing
Ion Milling Custom Systems Diamond coating Control systems production Machines
Plasma Etching

 Lab equipments for process development
 Small-sized reactors with front door
 Medium-sized cylindrical reactors with top lid
 Systems with loadlock
 Chlorinated, fluorinated, brominated gases
 Manual, automatic or computer controlled systems

Automatic pumping unit
  - Dry pump or vane pump
  - Turbomolecular pump for corrosive gas application
  - Pressure regulation

Gases
  - Gas lines with massflow controllers
  - Separate gas cabinet

Etching monitoring
  - Laser interferometer

Substrate biasing
  - 300 or 600W (13.6MHz)
  - Pulsed plasma
  - Automatic matching network
  - Self-bias voltage measurements
MG 200
MG 200
MG 300
MG 300