Name : PLASSYS-BESTEK
Legal form : Limited Company
Capital : 500 000 euros
Established in : 1987
Registration : R.C. Corbeil
SIRET : 343 096 798 00032
Adress : 14 rue de la gare - 91630 Marolles-en Hurepoix - France
Phone : (33) 01 64 56 20 00 - Fax : (33) 01 64 56 10 03
Email : client@plassys.com
European Taxes : FR 29 343 096 798 00032

History

PLASSYS was founded in 1987. Its main activity consists in designing and manufacturing equipments for thin film deposition and etching.
For the last 20 years most prestigious public and private research centers benefit from PLASSYS expertise in the vacuum technology and application know-how
PLASSYS is also a supplier of production systems in the tribologic layers segment, DLC deposition and diamond deposition by PECVD.
PLASSYS different lines of products range from vacuum evaporation, sputtering deposition, plasma deposition, reactive plasma ashing techniques and ion milling.
PLASSYS technology is mainly applied in semiconductor, supraconductor, sensors, tribologic layers and optic layers industries.
PLASSYS’ technical leader is Mr Smutek, a specialist in plasma processing and radiofrequency techniques.
Since July 2007, Mr Heliot has been in charge of the management of the company as well as of its commercial development.
In order to simplify its legal structure, PLASSYS SA was absorbed by BESTEK Holding, hence the new corporate name of BESTEK SAS.