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Sputtering Systems

• Large range of options :

• Cylindrical, parallepipedic units with front door
• Standard chambers : 350, 400, 450, 600, 900 mm
• Single-wafer loadlock or cassette loadlock
• Rectangular or circular cathodes - DC or RF
• Clusters for confocal systems
• Reactive or non-reactive sputtering
• Static or dynamic deposition, planetary fixtures
• Substrate temperature up to 1000°C



• Applications :

• Monolayers
• Multilayers
• Magnetic layers
• Optical layers